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Journal of Applied Physics : Single dominant distribution of Ge nanogranule embedded in Al oxide thin film

By Seishi Abe, Masato Ohnuma, D. H. Ping, and Shigehiro Ohnuma

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Book Id: WPLBN0002169440
Format Type: PDF eBook :
File Size: Serial Publication
Reproduction Date: 18 November 2008

Title: Journal of Applied Physics : Single dominant distribution of Ge nanogranule embedded in Al oxide thin film  
Author: Seishi Abe, Masato Ohnuma, D. H. Ping, and Shigehiro Ohnuma
Volume: Issue : November 2008
Language: English
Subject: Science, Physics, Natural Science
Collections: Periodicals: Journal and Magazine Collection (Contemporary), Journal of Applied Physics Collection
Historic
Publication Date:
Publisher: American Institute of Physics

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Masato Ohnuma, D. H. Ping, And Shigehiro Ohnum, S. A. (n.d.). Journal of Applied Physics : Single dominant distribution of Ge nanogranule embedded in Al oxide thin film. Retrieved from http://hawaiilibrary.net/


Description
Description: This paper investigates size distribution of Ge nanogranules embedded in Al oxide thin film prepared by rf reactive sputtering method. It is found from the results of x-ray diffraction and small angle x-ray diffraction spectroscopy that their mean sizes distribute bimodally or single dominantly with respect to sputtering process parameter of additional oxygen ratio in Ar and Ge concentrations. Compositional plane of these distribution types reveals that single dominant distribution appears along the line of stoichiometric composition of Al2O3, and deviation from stoichiometry results in bimodal distribution. Thus, size uniformity of Ge nanogranules seems to be enhanced when the Al oxide matrix forms stoichiometric composition.

 

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